Work

Elements of hierarchical mask data preparation

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.479334

Authors: Christian K. Kalus, Michal Simecek

Institution: Sigma Engineering (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1996944307

FWCI:

Cites:

Cited by: 1

Related to: 10