Work

Longevity of 193-nm/ArF excimer pellicle

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.438394

Authors: Takashi Kozeki, Shigeto Shigematsu, Masahiro Kondo, Hiroaki Nakagawa

Institution: Mitsui Chemicals (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1997506192

FWCI:

Cites:

Cited by: 3

Related to: 10