Work

Computational lithography and inspection (CLI) and its applications in mask inspection, metrology, review, and repair

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.868034

Authors: Linyong Pang, Danping Peng, Lin He, Dongxue Chen, Vikram Tolani

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1997753933

FWCI: 0.427

Cites: 7

Cited by: 7

Related to: 10