Investigation and modeling of the electrical properties of metal–oxide–metal structures formed from chemical vapor deposited Ta2O5 films
Year: 2001
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.1381043
Authors: S. Blonkowski, M. Regache, A. Halimaoui
Institution: Orange (France)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1998104380