Work

E-beam direct write alignment strategies for the next generation node

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.771585

Authors: H. Alves, P. Hahmann, K.-H. Kliem, U. Weidenmueller, S. Jahr, C. G. Frase, D. Gnieser, H. Bosse, R. Zimmermann, C. Arndt

Institutions: Vistec Electron Beam (Germany), Physikalisch-Technische Bundesanstalt

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998105664

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