Work

Twenty-five nm features patterned with trilevel e-beam resist

Year: 1981

Type: article

Source: Journal of Vacuum Science and Technology

DOI: 10.1116/1.571265

Authors: D. M. Tennant, L. D. Jackel, R. E. Howard, E. L. Hu, P. Grabbe, R. J. Capik, B. S. Schneider

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998323276

FWCI: 1.681

Cites:

Cited by: 26

Related to: 10