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Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition

Year: 2008

Type: article

Source: Journal of the American Chemical Society

DOI: 10.1021/ja807802r

Authors: Navneet Kumar, Angel Yanguas-Gil, Scott R. Daly, Gregory S. Girolami, John R. Abelson

Institution: University of Illinois Urbana-Champaign

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998377008

FWCI: 0.247

Cites: 12

Cited by: 40

Related to: 10