Work

Inductively coupled plasma etch of DUV MoSi photomasks: a designed study of etch chemistries and process results

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.332879

Authors: Chris Constantine, David J. Johnson, Russell J. Westerman, Andrew C. Hourd

Institution: Compugraphics (United Kingdom)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998534332

FWCI: 2.568

Cites: 2

Cited by: 4

Related to: 10