Work

Electric conduction of silicon nitride induced by Si ion implantation

Year: 2000

Type: article

Source: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

DOI: 10.1016/s0168-583x(00)00009-4

Authors: Masami Ikeyama, Setsuo Nakao, Hiroaki Niwa, Yoshiko Miyagawa, Soji Miyagawa, Kazuo Saitoh

Institution: Nagoya Industrial Science Research Institute

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998870071

FWCI: 0.326

Cites: 7

Cited by: 2

Related to: 10