Work

Ultra-shallow depth profiling with secondary ion mass spectrometry

Year: 2004

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1622672

Authors: M. Tomita, C. Hongo, M. Suzuki, M. Takenaka, A. Murakoshi

Institution: Toshiba (Japan)

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1999080404

FWCI: 2.385

Cites: 9

Cited by: 21

Related to: 10