Crystallization of In2Se3semiconductor thin films by post-deposition heat treatment. Thickness and substrate effects
Year: 1999
Type: article
Abstract: Polycrystalline thin films of -In 2 Se 3 were grown on various substrates by sequential thermal evaporation of In and Se. The crystallization was achieved by annealing the as-deposited films in flowing nitrogen. The depositions were carried out for different atomic ratios (1.5 R = [Se]/[In] 5) and the annealings performed at 400 °C for 0.5 h. X-ray diffraction, energy dispersive x-ray analysis, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman scattering have shown that thin films of high crystalline quality were obtained. The influence of the substrate nature as well as the film thickness on the crystallite preferential orientation and size is studied.
Authors: M Emziane, R Le Ny
Institutions: Université de Nantes, Nantes Université
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W1999526139