Work

Damage Free Particle Removal from Extreme Ultraviolet Lithography Mask Layers by High Energy Laser Shock Wave Cleaning

Year: 2008

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.47.4886

Authors: Tae-Gon Kim, Young-Sam Yoo, Tae-Geun Kim, Jinho Ahn, Jong-Myoung Lee, Jae-Sung Choi, Ahmed A. Busnaina, Jin-Goo Park

Institutions: Hanyang University, Northeastern University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000006273

FWCI: 0.821

Cites: 19

Cited by: 8

Related to: 10