Work

Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.575989

Authors: Tsann-Bim Chiou, Alek C. Chen, Stephen D. Hsu, Mark Eurlings, Eric Hendrickx

Institutions: ASML (Netherlands), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000268006

FWCI: 1.126

Cites:

Cited by: 4

Related to: 10