Work

Surface diagnostics of dry etched III–V semiconductor samples using focused ion beam and secondary ion mass spectrometry

Year: 1999

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.590958

Authors: Siyuan Yu, Peter Heard, Bulent Cakmak, R. V. Penty, I. H. White

Institution: University of Bristol

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000408651

FWCI: 0.748

Cites: 5

Cited by: 6

Related to: 9