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Interfacial Behavior and Film Patterning of Redox‐Active Cationic Copper(II)‐Containing Surfactants

Year: 2008

Type: article

Source: Chemistry - A European Journal

DOI: 10.1002/chem.200801215

Authors: Jeffery A. Driscoll, Marco M. Allard, Libo Wu, Mary Jane Heeg, Sandro R. P. da Rocha, Cláudio N. Verani

Institution: Wayne State University

Language: English

Topic: Surfactants and Colloidal Systems

Subfield: Organic Chemistry

Field: Chemistry

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000485959

FWCI: 0.826

Cites: 71

Cited by: 23

Related to: 10