Work

Dyed red, green, and blue photoresist for manufacture of high-resolution color filter arrays for image sensors

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.476750

Authors: Douglas J. Guerrero, William DiMenna, Tony D. Flaim, Ramil Mercado, Sam Sun

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000534914

FWCI: 0.449

Cites:

Cited by: 18

Related to: 10