Work

High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating

Year: 2013

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/j.surfcoat.2013.04.020

Authors: Tie-Gang Wang, Yanmei Liu, Hossein Sina, Changming Shi, Srinivasan Iyengar, Solveig Melin, Kwang Ho Kim

Institutions: Lund University, Chinese Academy of Sciences, Institute of Metal Research, Pusan National University

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: European Commission, National Research Foundation of Korea, Ministry of Education, Science and Technology

Award: G2304585441

OpenAlex ID: W2000560059

FWCI: 2.199

Cites: 45

Cited by: 29

Related to: 10