Work

Dry etching properties of methyl-BCN film with C4F8 gas for Cu/low-k interconnection

Year: 2010

Type: article

Source: Diamond and Related Materials

DOI: 10.1016/j.diamond.2010.01.025

Authors: Hidemitsu Aoki, Makoto Hara, Takuroh Masuzumi, Farid Ahmed, Chiharu Kimura, Takashi Sugino

Institution: The University of Osaka

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000674330

FWCI: 0.394

Cites: 12

Cited by: 7

Related to: 10