Work

Thin SiO2 films nitrided in N2O

Year: 1994

Type: article

Source: Microelectronics Journal

DOI: 10.1016/0026-2692(94)90033-7

Authors: N. Bellafiore, F. Pio, C. Riva

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Division of Electrical, Communications and Cyber Systems

OpenAlex ID: W2000694847

FWCI: 1.438

Cites: 4

Cited by: 7

Related to: 10