Work

CD optimization methodology for extending optical lithography

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2009397

Authors: C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Institutions: IBM (United States), ASML (Netherlands), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000706756

FWCI: 2.036

Cites:

Cited by: 6

Related to: 10