Ambient Low Temperature Plasma Etching of Polymer Films for Secondary Ion Mass Spectrometry Molecular Depth Profiling
Year: 2012
Type: article
Source: Analytical Chemistry
DOI: 10.1021/ac302718u
Institution: National Institute of Standards and Technology
Language: English
Subfield: Computational Mechanics
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2000714756
