Work

Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)

Year: 2010

Type: article

Abstract: The synthesis and properties of noria derivatives containing oxetanyl groups were investigated for their application as negative-type extreme ultraviolet (EUV) resist materials. The solubility, film-forming ability, and photochemical reactivity were consistent with the structures of noria derivatives. The patterning properties of the synthesized noria derivatives were also examined using an EUV system, and patterns with 45 and 50 nm half-pitch resolution were obtained.

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.49.06gf06

Authors: Hiroyuki Seki, Yuki Kato, Hiroto Kudo, Hiroaki Oizumi, Toshiro Itani, Tadatomi Nishikubo

Institutions: Kanagawa University, Semiconductor Leading Edge Technologies, Inc (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funder: Ministry of Education, Culture, Sports, Science and Technology

OpenAlex ID: W2000796949

FWCI: 2.696

Cites: 13

Cited by: 23

Related to: 10