Work

Active dopant characterization methodology for germanium

Year: 2006

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2163880

Authors: T. Clarysse, P. Eyben, T. Janssens, I. Hoflijk, D. Vanhaeren, A. Satta, M. Meuris, W. Vandervorst, J. Bogdanowicz, G. Raskin

Institutions: IMEC, KU Leuven, University of Liège, Umicore (Belgium)

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000853161

FWCI: 4.265

Cites: 8

Cited by: 31

Related to: 10