Work

Halogen chemisorption, the pairwise diffusion of I, and trapping by defects on Si(100)

Year: 2005

Type: article

Source: Surface Science

DOI: 10.1016/j.susc.2004.12.026

Authors: G.J. Xu, A.W. Signor, Abhishek Agrawal, Koji S. Nakayama, B.R. Trenhaile, J.H. Weaver

Institution: University of Illinois Urbana-Champaign

Language: English

Topic: Surface Chemistry and Catalysis

Subfield: Physical and Theoretical Chemistry

Field: Chemistry

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000862046

FWCI: 1.599

Cites: 28

Cited by: 18

Related to: 10