Charge trapping properties of the HfO2 layer with various thicknesses for charge trap flash memory applications
Year: 2010
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.3337103
Authors: Hee-Wook You, Won-Ju Cho
Institution: Kwangwoon University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2000947237