Hall factor and drift mobility for hole transport in strained Si1−xGex alloys
Year: 1997
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.363906
Authors: K. B. Joelsson, Y. Fu, W.-X. Ni, G. V. Hansson
Institutions: Linköping University, Chalmers University of Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2000990386