Work

Influence of carbon monoxide gas on silicon dioxide dry etching

Year: 1996

Type: article

Source: Surface Science

DOI: 10.1016/0039-6028(95)01313-x

Authors: N. Omori, H. Matsuo, S. Watanabe, M. Puschmann

Institution: Mitsubishi Electric (Japan)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001120377

FWCI: 0.923

Cites: 6

Cited by: 16

Related to: 10