Work

Defect passivation in chemical vapour deposited fine-grained polycrystalline silicon by plasma hydrogenation

Year: 2005

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2005.01.081

Authors: L. Carnel, I. Gordon, K. Van Nieuwenhuysen, D. Van Gestel, G. Beaucarne, J. Poortmans

Institution: IMEC

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001422016

FWCI: 5.695

Cites: 11

Cited by: 33

Related to: 10