Work

Contact hole reticle optimization by using interference mapping lithography (IML)

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.557747

Authors: Robert J. Socha, Douglas J. Van Den Broeke, Stephen D. Hsu, J. Fung Chen, Thomas L. Laidig, Noel P. Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, Willard E. Conley

Institution: Motorola (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001790722

FWCI: 2.906

Cites:

Cited by: 29

Related to: 10