Work

Patterning of x-ray masks using the negative-acting resist P(SI-CMS)

Year: 1993

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.586611

Authors: D. A. Mixon, A. E. Novembre, W. W. Tai, C. W. Jurgensen, J. Frackoviak, L. E. Trimble, R. R. Kola, G. K. Celler

Institution: AT&T (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001898511

FWCI: 0.494

Cites:

Cited by: 6

Related to: 10