Work

Electron beam/optical intralevel mix-and-match lithography for deep submicron device fabrication

Year: 1990

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.585184

Authors: Tadahito Matsuda, Kazumi Iwadate, Akinobu Tanaka, Yoshio Kawai, Kazuhiko Komatsu

Institution: NTT (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2001968554

FWCI:

Cites:

Cited by: 2

Related to: 10