Work

Rare earth-doped alumina thin films deposited by liquid source CVD processes

Year: 1998

Type: article

Source: Journal of Alloys and Compounds

DOI: 10.1016/s0925-8388(98)00433-2

Authors: J.L Deschanvres, W Meffre, J.C Joubert, J.P Senateur, F Robaut, J.E Broquin, R Rimet

Institutions: Centre National de la Recherche Scientifique, Laboratoire des Matériaux et du Génie Physique, Institut polytechnique de Grenoble

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2002193479

FWCI: 0.946

Cites: 4

Cited by: 20

Related to: 10