Work

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.537931

Authors: Chi-Sun Hong, Sang-Ho Lee, Woo-Kyu Kim, Takanori Kudo, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Dalil M. Rahman, Guanyang Lin, Ralph R. Dammel, Munirathna Padmanaban

Institution: Clariant (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2003106964

FWCI:

Cites:

Cited by: 1

Related to: 10