Work

Silicon carbide Schottky and ohmic contact process dependence

Year: 2002

Type: article

Source: Diamond and Related Materials

DOI: 10.1016/s0925-9635(01)00711-7

Authors: M. Badila, G. Brezeanu, J. Millan, P. Godignon, V. Banu

Institutions: National Institute for Research and Development in Microtechnologies, Universitatea Națională de Știință și Tehnologie Politehnica București

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2003109201

FWCI: 0.446

Cites: 6

Cited by: 14

Related to: 10