Effect of thin gate dielectrics and gate materials on simulated device characteristics of 3D double gate JNT
Year: 2014
Type: article
Authors: A. Baidya, V. Krishnan, S. Baishya, T.R. Lenka
Institution: National Institute Of Technology Silchar
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2003228306