Theory of radiative recombination by diffusion and tunneling in amorphous Si:H
Year: 1981
Type: article
Authors: K. M. Hong, J. Noolandi, R. A. Street
Institutions: Xerox (Canada), Palo Alto Research Center
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2003808759