Local epitaxy of TiSi2 on (111)Si: Effects due to rapid thermal annealing and to the annealing atmosphere
Year: 1986
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.337731
Authors: I. C. Wu, J. J. Chu, L. J. Chen
Institution: National Tsing Hua University
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
Funder: National Science Council
OpenAlex ID: W2004048635