Work

Optimum B+ implantation conditions for the edge termination of the Au/n-Si Schottky diodes

Year: 2002

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1458953

Authors: C. S. Choi, W. Y. Choi, M. H. Joo, J. H. Song, S. Im

Institutions: Yonsei University, Korea Institute of Science and Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Yonsei University

OpenAlex ID: W2004874852

FWCI: 0.437

Cites: 11

Cited by: 3

Related to: 10