Work

Nanometer-scale crystallization of thin HfO2 films studied by HF-chemical etching

Year: 2005

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.1939073

Authors: Shinji Fujii, Noriyuki Miyata, Shinji Migita, Tsuyoshi Horikawa, Akira Toriumi

Institutions: Association of Super-Advanced Electronics, National Institute of Advanced Industrial Science and Technology, The University of Tokyo

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004946005

FWCI: 3.381

Cites: 8

Cited by: 48

Related to: 10