Work

Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.377108

Authors: Amikam Sade, Juergen Fandrich, Shirley Hemar, Yair Eran

Institutions: Applied Materials (Israel), Applied Materials (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004994838

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