Interfacial reactions between thin rare-earth-metal oxide films and Si substrates
Year: 2001
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.1357445
Authors: Haruhiko Ono, Tooru Katsumata
Institutions: NEC (Japan), Toyo University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2005116970