Work

High rate deposition of hard a-C:H films using microwave excited plasma enhanced CVD

Year: 2011

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/j.surfcoat.2010.12.047

Authors: M. Günther, I. Bialuch, S. Peter, K. Bewilogua, F. Richter

Institutions: Chemnitz University of Technology, Fraunhofer Institute for Surface Engineering and Thin Films

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005232618

FWCI: 2.006

Cites: 29

Cited by: 14

Related to: 10