Work

Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

Year: 2014

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.4866001

Authors: Hyunsoo Jung, Heeyoung Jeon, Hagyoung Choi, Giyul Ham, Seokyoon Shin, Hyeongtag Jeon

Institutions: Samsung (South Korea), Samsung Display (South Korea), Hanyang University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005382937

FWCI: 2.432

Cites: 23

Cited by: 34

Related to: 10