Process limitations of magnetically enhanced reactive ion etch equipment
Year: 2006
Type: article
Source: Surface Engineering
Authors: B. Kim, J. Y. Park, S. J. Hong
Institutions: Sejong University, Kwangwoon University, Myongji University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2005388772