The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD
Year: 2010
Type: article
Source: Applied Surface Science
Authors: Doyoung Kim, Hyemin Kang, Jae-Min Kim, Hyungjun Kim
Institution: Yonsei University
Language: English
Topic: ZnO doping and properties
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
Awards: G240464493, G6766143807
OpenAlex ID: W2005392027