Work

Multiscale simulation for epitaxial silicon carbide growth by chlorides route

Year: 2009

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2009.10.045

Authors: Maurizio Masi, Alessandro Fiorucci, Massimo Camarda, Antonino La Magna, Francesco La Via

Institutions: Politecnico di Milano, Institute for Microelectronics and Microsystems

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005459813

FWCI: 0.528

Cites: 24

Cited by: 4

Related to: 10