Work

A review of high dielectric materials for DRAM capacitors

Year: 1997

Type: article

Source: Integrated ferroelectrics

DOI: 10.1080/10584589708013025

Author: David E. Kotecki

Institution: IBM (United States)

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005992121

FWCI: 19.24

Cites: 20

Cited by: 129

Related to: 10