Work

Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

Year: 2014

Type: article

Abstract: This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.

Source: Metals

DOI: 10.3390/met4040639

Authors: Liliana Kotte, Jana Haag, Tobias Mertens, Stefan Kaskel

Institutions: Fraunhofer Institute for Material and Beam Technology, Airbus (Germany)

Language: English

Topic: Surface Treatment and Coatings

Subfield: Mechanical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $3,137

Funder: European Commission