Work

A Study of the Planarity by Sti Cmp Erosion Modeling

Year: 1999

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-566-33

Authors: K.H. Kim, S.R. Hah, J.H. Han, C.K. Hong, U.I. Chung, G.W. Kang

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2006080827

FWCI: 1.293

Cites: 2

Cited by: 2

Related to: 10