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Control of the free carrier concentrations in a Si-doped freestanding GaN grown by hydride vapor phase epitaxy

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Year: 2011
Type: article
Source: Journal of Crystal Growth
DOI: 10.1016/j.jcrysgro.2011.12.029
Authors: Hyun Jong Park, Hong-Yeol Kim, Jun Young Bae, Seonghwan Shin, Jihyun Kim
Institutions: Samsung (South Korea), Korea University
Language: English

Topic: GaN-based semiconductor devices and materials
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences

Open Access status: closed

Funders: Korea University, Ministry of Knowledge Economy, National Research Foundation of Korea, Ministry of Education, Science and Technology, Korea Institute of Energy Technology Evaluation and Planning
Award: G5146898719
OpenAlex ID: W2006571389
FWCI: 0.359
Cites: 17
Cited by: 5
Related to: 10
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