Control of the free carrier concentrations in a Si-doped freestanding GaN grown by hydride vapor phase epitaxy
Year: 2011
Type: article
Source: Journal of Crystal Growth
Institutions: Samsung (South Korea), Korea University
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
Award: G5146898719
OpenAlex ID: W2006571389
